280A sec. 001 - Law and Technology Writing Workshop (Fall 2023)
Instructor: Allison Schmitt (view instructor's teaching evaluations - degree students only)
Instructor: Wayne O Stacy (view instructor's teaching evaluations - degree students only)
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Units: 2
Grading Designation: Graded
Mode of Instruction: In-Person
Meeting:
Th 3:35 PM - 5:25 PM
Location: Law 145
From August 21, 2023
To December 06, 2023
Course End: December 06, 2023
Enrollment info:
Enrolled: 11
Waitlisted: 0
Enroll Limit: 15
As of: 02/07 02:03 PM
In this writing workshop students will prepare 30+ page papers commenting on important law and technology developments for potential publication in the Berkeley Technology Law Journal’s Annual Review of Law and Technology issue. Topics may include developments in the law of intellectual property (copyright, patent, trademark, etc.), privacy, cybersecurity, telecommunications, antitrust, artificial intelligence, and other relevant subject matter areas. Accepted papers will be finalized for publication in Spring 2024 .
Admission will be based on an application process. The application form, including submission instructions, is posted below as a "supplemental file." JD and JSP applications are due April 30th. For transfer JDs and LLMs, applications are due July 31st.
Attendance at the first class is mandatory for all currently enrolled and waitlisted students; any currently enrolled or waitlisted students who are not present on the first day of class (without prior permission of the instructor) will be dropped. The instructor will continue to take attendance throughout the add/drop period and anyone who moves off the waitlist into the class must continue to attend or have prior permission of the instructor in order not to be dropped.
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Requirements Satisfaction:
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Exam Notes: (P) Final paper
(Subject to change by faculty member only through the first two weeks of instruction)
Course Category: Intellectual Property and Technology Law
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Readers:
No reader.
Books:
Instructor has indicated that no books will be assigned.